Uniform nanocrystalline diamond coating deposition to a high aspect ratio tungsten carbide substrate in the microwave plasma reactor
E. E. Ashkinazi1, S. V. Fedorov2, A. K. Martyanov1, A. P. Litvinov2, K. F. Sergejchev1, M. Yu. Shevchenko3, S. N. Grigoriev2, V. I. Konov1
1 A.M. Prokhorov Institute of General Physics of Russian Academy of Sciences,
38 Vavilova str., 119991 Moscow, Russia
2 Moscow State Technological University “STANKIN”,
3A Vadkovsky Lane, 127055 Moscow, Russia
E-mail: sv.fedorov@icloud.com
3 2dot4 Diamonds, LLC, Plot Number TPO 10219, National Industries Park, Dubai
E-mail: xpohoc@gmail.com
A tool made of a tungsten carbide with a diamond coating deposited to its working surfaces is promising for cutting composite materials containing components with high hardness. One of the promising ways to obtain such a coating is the method of growing a diamond film in a microwave plasma. However, the qualitative growth of the film is hindered by the uneven temperature distribution caused by inhomogeneities of the electromagnetic field in the microwave plasma, in particular, along the surface of the axial tool, which is an object with a high aspect ratio. To ensure uniform heating of the sample surface, a three-dimensional model of the electromagnetic field distribution in a reactor layout of a plasma chemical installation, in a simplified geometry corresponding to the ARDIS 100 microwave reactor, was studied using the finite element method in a COMSOL Multiphysics. It is shown that the uniformity of heating of both the cylindrical perimeter and the end part of the substrate can be achieved using a microwave plasma discharge initiated by a field concentrator and a spherical plasma circuit formed by a microwave field flowing around a transverse waveguide, which was implemented on experimental industrial equipment. Scanning electron microscopy, X-ray fluorescence analysis, and Raman spectroscopy have confirmed the result of applying a uniform nanocrystalline diamond coating on tungsten carbide substrates with 6 % Co from mixtures of gases CH4/H2 and CH4/H2/N2 to carbide substrates with an aspect ratio of L/d = 75 mm/12 mm. Data on grain sizes, as well as reflection intensities corresponding to the phases of diamond and ordered graphite, demonstrate the uniformity of the coating in its thickness, controlled by two measurements of the cylindrical body of the substrate. At the same time, diamond globules ranging in size from 320 to 690 nm were present in the structure of the coating under study.
Keywords: diamond coating, microwave plasma, MPCVD, edge effect, micro-nanocrystalline film, initiated discharge.
DOI: 10.30791/0015-3214-2026-2-29-40